| Description |
1 online resource (xv, 582 pages) : illustrations, plans |
| Contents |
9780854044658; i_iv; v_vi; vii_xvi; 001_036; 037_092; 093_157; 158_206; 207_271; 272_319; 320_356; 357_412; 413_450; 451_476; 477_493; 494_534; 535_570; 571_582 |
| Summary |
Chemical Vapour Deposition (CVD) involves the deposition of thin solid films from chemical precursors in the vapour phase, and encompasses a variety of deposition techniques, including a range of thermal processes, plasma enhanced CVD (PECVD), photon- initiated CVD, and atomic layer deposition (ALD). The development of CVD technology owes a great deal to collaboration between different scientific disciplines such as chemistry, physics, materials science, engineering and microelectronics, and the publication of this book will promote and stimulate continued dialogue between scientists from thes |
| Bibliography |
Includes bibliographical references and index |
| Notes |
Print version record |
| Subject |
Chemical vapor deposition.
|
|
TECHNOLOGY & ENGINEERING -- Technical & Manufacturing Industries & Trades.
|
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Chemical vapor deposition
|
| Form |
Electronic book
|
| Author |
Jones, Anthony C.
|
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Hitchman, Michael L.
|
| ISBN |
9781847558794 |
|
1847558798 |
|
9781621987031 |
|
1621987035 |
|
0854044655 |
|
9780854044658 |
|
