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Title The chemistry of metal CVD / edited by Toivo T. Kodas and Mark J. Hampden-Smith
Published Weinheim ; New York : VCH, [1994]
Online access available from:
Wiley Online Books    View Resource Record  


Description 1 online resource (xxiv, 530 pages) : illustrations
Contents 1. Introduction -- 2. Chemical Vapor Deposition of Aluminum -- 3. Chemical Vapor Deposition of Tungsten -- 4. Chemical Vapor Deposition of Copper from Copper(II) Precursors -- 5. Chemical Vapor Deposition of Copper from Copper(I) Precursors -- 6. Chemical Vapor Deposition of Gold and Silver -- 7. Chemical Vapor Deposition of Platinum, Palladium and Nickel -- 8. Chemical Vapor Deposition of Assorted Metals -- 9. Overview of Metal CVD -- Appendix 1: Examples of Chemical Nomenclature
Summary High purity, thin metal coatings have a variety of important commercial applications, for example, in the microelectronics industry, as catalysts, as protective and decorative coatings as well as in gas-diffusion barriers. This book offers detailed, up- to-date coverage of the chemistry behind the vapor deposition of different metals from organometallic precursors. In nine chapters, the CVD of metals including aluminum, tungsten, gold, silver, platinum, palladium, nickel, as well as copper from copper(I) and copper(II) compounds is covered. The synthesis and properties of the precursors, the g
Bibliography Includes bibliographical references and index
Notes Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002. MiAaHDL
Print version record
Subject Chemical vapor deposition.
Electronic circuit design.
Metallic films.
Form Electronic book
Author Hampden-Smith, Mark J.
Kodas, Toivo T. (Toivo Tarmo), 1958-
ISBN 3527615849 (electronic bk.)
9783527615841 (electronic bk.)