| Description |
various pagings : illustrations ; 23 cm |
| Series |
McGraw-Hill handbooks |
|
McGraw-Hill handbooks.
|
| Contents |
pt. 1. Preparation of thin films -- 1. Vacuum evaporation -- 2. High-vacuum technology -- 3. The nature of physical sputtering -- 4. Application of sputtering to the deposition of films -- 5. The deposition of thin films by chemical methods -- 6. Thin film substrates -- 7. Generation of patterns in thin films -- pt. 2. The nature of thin films -- 8. Condensation, nucleation, and growth of thin films -- 9. Determination of structures in films -- 10. The growth and structure of single-crystal films -- 11. Film thickness and composition -- p.t. 3. Properties of thin films -- 12. Mechanical properties of thin films -- 13. Electrical properties of metallic thin films -- 14. Electronic conduction through thin insulating films -- 15. Piezoelectric and piezoresistive properties of films -- 16. Dielectric properties of thin films -- 17. Ferromagnetic properties of films -- pt. 4. Applications of thin films -- 18. Thin film resistors -- 19. Thin film capacitors -- 20. Thin film active devices -- 21. Magnetic devices -- 22. Superconductive think films and devices -- 23. Thin films in integrated circuits |
| Bibliography |
Includes bibliographies |
| Notes |
Also issued online |
| Subject |
Thin film devices.
|
|
Thin films.
|
| Author |
Glang, Reinhard, editor
|
|
Maissel, Leon I., editor
|
| LC no. |
73079497 |
| ISBN |
0070397422 |
|
