| Description |
1 online resource (xiv, 465 pages) : illustrations |
| Contents |
Exposure system -- EUV sources -- EUV optics -- Multilayer interference coatings for EUVL -- EUV photoresist -- EUVL masks |
| Summary |
"Explains the most promising innovation in microlithography today. This landmark resource provides the first complete guide to extreme ultraviolet lithography (EUVL), covering the latest scientific theory, processing methods, applications, and future directions. Edited by two renowned EUVL experts, the reference contains contributions by prominent engineers at leading semi-conductor manufacturers such as Intel and ASM Lithography.Designed to help you optimize EUVL, Extreme Ultraviolet Lithography covers EUV lithography tools, EUV printer, EUV sources, multilayer EUV, EU Voptics, defect control, resist, mask techniques, and more." |
| Notes |
Titles from cover image and table of contents, viewed on Aug. 20, 2009 |
|
Print version c2009 |
| Bibliography |
Includes bibliographical references and index |
| Notes |
English |
| Subject |
Extreme ultraviolet lithography.
|
|
Integrated circuits -- Masks.
|
|
Integrated circuits -- Design and construction.
|
|
Extreme ultraviolet lithography.
|
|
Integrated circuits -- Design and construction.
|
|
Integrated circuits -- Masks.
|
| Form |
Electronic book
|
| Author |
Wu, Banqiu
|
|
Kumar, Ajay, 1962-
|
|
Naulleau, Patrick P. (Patrick Pascal)
|
|
Eynon, Benjamin G
|
|
La Fontaine, Bruno
|
|
Yulin, Sergiy
|
|
Richardson, Martin
|
|
Silver, Richard M
|
|
Vladar, Andras E
|
|
Kamberian, Henry
|
| ISBN |
9780071664790 |
|
0071664793 |
|
