Title International Conference on Simulation of Semiconductor Processes and Devices : [proceedings]

Published Piscataway, NJ : Institute of Electrical and Electronics Engineers 1st (1996)-

Online access available from: IEEE Xplore    01 Jan. 1996- View Resource Record

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Description Online resource Prior Title International Conference on Simulation of Semiconductor Devices and Processes. Simulation of Semiconductor Devices and Processes Notes Imprints vary, eg Wein: Springer Verlag; New Jersey : IEEE; Tokyo: Business Center Academic Societies Vols. for <1996-1997> are technical digests Conference unifies three precedent conferences: International Workshop on Numerical Modeling of Processes and Devices for Integrated Circuits (NUPAD); International Conference on Ssimulation of Semiconductor Devices and Processes (SISDEP); International Workshop on VLSI Process and Device Modeling (VPAD) Description based on: 1998; title from caption (IEEexplore website, viewed Jan. 12, 2008) Latest issue consulted: 2008 (IEEexplore website, viewed Jan. 12, 2008) Form Electronic journal Author IEEE Electron Devices Society Ōyō Butsuri Gakkai Institute of Electrical and Electronics Engineers LC no. 2009200104 ISSN 1946-1577 1946-1569

ABBREV TI Int. Conf. Simul. Semicond. Process. Devices (Online) OTHER TI International Conference on Simulation of Semiconductor Processes and Devices (Online) Other Titles SISPAD Simulation of Semiconductor Processes and Devices

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