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Title Characterization in compound semiconductor processing / editors, Yale Strausser and Gary E. McGuire ; series editors, C. Richard Brundle and Charles A. Evans
Published New York, NY : Momentum Press, 2010
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Description 1 online resource (xvi, 199 pages) : illustrations
Series Materials characterization series
Materials characterization series.
Contents Characterization of III-V thin films for electronic devices / J.N. Miller and T.S. Low -- III-V compound semiconductor films for optical applications / Thomas F. Kuech -- Contacts / T. Sands and S.A. Schwarz -- Dielectric insulating layers / H.H. Wieder -- Other compound semiconductor films / Owen K. Wu and David R. Rhiger -- Deep level transient spectroscopy : a case study on GaAs / Werner K. Götz and Noble M. Johnson
Summary "Characterization in Compound Semiconductor Processing is for scientists and engineers working with compound semiconductor materials and devices who are not characterization specialists. Materials and processes typically used in R & D and in the fabrication of GaAs, GaA1As, InP and HgCdTe based devices provide examples of common analytical problems. The book discusses a variety of characterization techniques to provide insight into how each individually, or in combination, might be used in solving problems associated with these materials. The book will help in the selection and application of the appropriate analytical techniques by its coverage of all stages of materials or device processing: substrate preparation, epitaxial growth, dielectric film deposition, contact formation and dopant introduction."--Page 4 of cover
Notes "First published by Butterworth-Heinemann in 1995 ... Reissued volume published in 2010 by Momentum Press"--Title page verso
Bibliography Includes bibliographical references and index
Notes Print version record
Subject Compound semiconductors -- Surfaces.
Compound semiconductors.
Form Electronic book
Author McGuire, G. E.
Strausser, Yale.
ISBN 1606500414
1606500430
9781606500415
9781606500439
Other Titles Compound semiconductor processing