| Description |
1 online resource (269 pages) |
| Contents |
Nanoimprint Lithography: An Enabling Processfor Nanofabrication; Foreword; Preface; Contents; Chapter 1: Introduction; 1.1 Nanofabrication and Nanoimprint Lithography; 1.2 Purpose and Content of the Book; References; Chapter 2: Principles and Status of Nanoimprint Lithography; 2.1 Introduction; 2.2 Photolithography; 2.2.1 Photolithography Concepts; 2.2.2 Next-Generation Lithography; 2.3 Development of Nanoimprint Lithography; 2.3.1 Principles of Nanoimprint Lithography; 2.3.2 History of Nanoimprint Lithography; 2.3.3 Classification of Nanoimprint Lithography |
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2.3.4 Research Field of Nanoimprint Lithography2.4 Critical Issues in Nanoimprint Lithography; 2.4.1 Mold Fabrication; 2.4.2 Imprint Resist; 2.4.3 Defects Control; 2.4.4 Alignment and Overlay; 2.4.5 3D Imprint Process; 2.4.6 Large-Area Imprinting and Throughput; 2.5 Tools and Evaluation of Nanoimprint Lithography; 2.5.1 Imprint Machine; 2.5.2 Metrology for Nanoimprint Lithography; 2.5.2.1 Optical Microscopy; 2.5.2.2 Atomic Force Microscopy; 2.5.2.3 Scanning Electron Microscope; 2.6 Research Status of Nanoimprint Lithography; 2.6.1 Publication Analysis; 2.6.2 Patents Analysis |
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2.7 Direction and Vision for Nanoimprint Lithography2.7.1 Challenges for Nanoimprint Lithography; 2.7.2 Vision for Nanoimprint Lithography; References; Chapter 3: Stamp Fabrication; 3.1 Introduction; 3.2 Stamp Materials; 3.3 Conventional Lithography for Stamp Fabrication; 3.3.1 Electron Beam Lithography; 3.3.1.1 Electron Beam Lithography System; 3.3.1.2 SEM and Pattern Generation System; 3.3.1.3 Mold Fabrication by Electron Beam Lithography; 3.3.2 Ion Beam Lithography; 3.3.3 Ultraviolet Lithography; 3.3.4 X-Ray Lithography; 3.3.5 Holographic Lithography |
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3.4 Unconventional Lithography for Stamp Fabrication3.4.1 Edge Lithography; 3.4.2 Nanosphere Lithography; 3.4.3 Chemical Vapor Deposition; 3.4.4 Wet Etching; 3.4.5 Block Copolymers Lithography; 3.4.6 Anodization Process for Anodic Aluminum Oxide; 3.4.7 Electrodeposition; 3.4.8 Liquid-Phase Deposition; 3.4.9 Nanoimprint Lithography; 3.4.10 AFM Lithography; 3.4.11 Replication of Master; 3.5 Characterization of Stamp; 3.5.1 Microscopy; 3.5.2 CD-SAXS and SXR; 3.6 Critical Issues in Stamp Fabrication; References; Chapter 4: Stamp Surface Treatment; 4.1 Introduction; 4.2 Adhesion and Friction |
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4.3 Stamp Cleaning4.4 Assessment of Anti-adhesive Layers; 4.4.1 Wettability; 4.4.2 Chemical Analysis; 4.4.3 Film Thickness; 4.4.4 Morphology and Adhesion; 4.4.5 Thermostability and Chemical Stability; 4.4.6 Roughness; 4.5 Fabrication Methods of Anti-adhesive Layers; 4.5.1 Plasma Polymerization; 4.5.2 Self-Assembly Monolayer; 4.5.3 Depositing Diamond-Like Carbon Film; 4.5.4 Depositing Metal Nanoparticles; 4.5.5 Spin Coating; References; Chapter 5: Nanoimprint Lithography Resists; 5.1 Introduction; 5.2 Characteristics of Nanoimprint Lithography Resist; 5.2.1 Properties of Film Coating |
| Summary |
Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It provides the exciting, multidisciplinary field, offering a wide range of topics covering: principles, process, material and application. This book would be of specific interest for researchers and graduate students in the field of nanoscience, nanotechnology and nanofabrication, material, physical, che |
| Bibliography |
Includes bibliographical references and index |
| Notes |
Print version record |
| Subject |
Nanolithography.
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TECHNOLOGY & ENGINEERING -- Electronics -- Circuits -- General.
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Ingénierie.
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Nanolithography
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| Form |
Electronic book
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| ISBN |
9783642344282 |
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3642344283 |
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1283946327 |
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9781283946322 |
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