| Description |
1 online resource (xv, 244 pages) |
| Contents |
Ion beam technology : overview and history -- History and milestones of cluster beam development -- Development of cluster beam sources for solid materials -- Gas cluster ion beam equipment -- Cluster ion-solid surface interaction kinetics -- Cluster ion beam sputtering -- Cluster ion implantation -- Cluster ion beam-assisted deposition -- Applications -- Conclusions |
| Summary |
Materials Processing by Cluster Ion Beams: History, Technology, and Applications discusses the contemporary physics, materials science, surface engineering issues, and nanotechnology capabilities of cluster beam processing. Written by the originator of the gas cluster ion beam (GCIB) concept, this book: offers an overview of ion beam technologies, from the discovery of monomer ions to the introduction of GCIBs; explores the development of sources for producing cluster beams from solid materials; describes the engineering characteristics of gas cluster ion beam equipment; covers cluster ion-solid surface interaction kinetics as well as sputtering, implantation, and ion-assisted deposition; details surface processing techniques for smoothing, shallow implantation, and preparation of high-quality thin films; introduces representative examples of emerging GCIB industrial applications |
| Bibliography |
Includes bibliographical references and index |
| Notes |
Print version record |
| Subject |
Ion bombardment.
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Complex ions.
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Materials -- Effect of radiation on.
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Nanostructured materials.
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TECHNOLOGY & ENGINEERING -- Engineering (General)
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TECHNOLOGY & ENGINEERING -- Reference.
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Complex ions
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Ion bombardment
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Materials -- Effect of radiation on
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Nanostructured materials
|
| Form |
Electronic book
|
| ISBN |
9781498711760 |
|
1498711766 |
|
1498711758 |
|
9781498711753 |
|
9781498733878 |
|
1498733875 |
|
