Title Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions / edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood

Published Park Ridge, N.J., U.S.A. : Noyes Publications, [1990] ©1990

Copies

Location	Call no.	Vol.	Availability
W'PONDS	621.044 Ros/Hop		AVAILABLE

Description xxiii, 523 pages : illustrations ; 25 cm Series Materials science and process technology series Materials science and process technology series. Summary An overview of the technology that describes the advantages provided by plasmas, plasma fundamentals, and a range of plasma processes relevant to the deposition and etching of thin films for microelectronics and other fields Bibliography Includes bibliographical references Notes Also available online via the World Wide Web, by subscription to Knovel Mode of access: World Wide Web Print version record Subject Plasma engineering. Plasma etching. Semiconductors -- Etching. Thin films. Author Cuomo, J. J. Rossnagel, Stephen M. Westwood, William D. (William Dickson), 1937- LC no. 89022834 ISBN 0815512201 1591242975 (electronic bk.)

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