Title A Lithographer's Guide to Patterning CMOS Devices with Directed Self-Assembly

Published Bellingham : Society of Photo-Optical Instrumentation Engineers, 2020

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Description 1 online resource (32 p.) Contents Intro -- Copyright -- Series page -- Preface -- 1 Introduction -- 2 Directed Self-Assembly and Block Copolymers -- 3 Process Flows -- 3.1 Graphoepitaxial flows -- 3.1.1 Contact holes -- 3.1.2 Lines and spaces -- 3.2 Chemical-Epitaxial flows -- 3.2.1 LiNe flow -- 3.2.2 Chemoepitaxy induced by pillar structures flow -- 3.2.3 SMART™ flow -- 3.2.4 Polymer brush guiding flow -- 3.2.5 ACE flow -- 3.2.6 Flow simplifications -- 4 Combining Grapho- and Chemoepitaxial Flows -- 5 Combining DSA with EUV Lithography -- 6 Material Modification for Pattern Transfer 7 Applications of DSA for Device Fabrication -- 8 Defectivity -- 9 Metrology -- 10 Summary -- References -- Author biography Summary This Spotlight provides a quick survey of methods used for patterning small structures using directed self-assembly (DSA). All flows currently considered are presented, along with the benefits and shortcomings of each, in an easy-to-follow guide for anyone doing patterning work. Materials needed and used in these processes are discussed Notes Description based upon print version of record Subject Microlithography. Metal oxide semiconductors, Complementary. Integrated circuits -- Design and construction. Self-assembly (Chemistry) Integrated circuits -- Design and construction Metal oxide semiconductors, Complementary Microlithography Self-assembly (Chemistry) Form Electronic book ISBN 9781510637016 151063701X

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