Silicon run implantation / National Science Foundation [and others] present a film by Ruth A. Carranza; producer and director, Ruth A. Carranza; writers, Ruth Carranza, John Shott
1 online resource (1 video file (31 min.)): sound, color
Summary
Silicon Run Implantation takes a close look at the process of ion implantation. This video shows how ions are accelerated to high energies and directed into specific regions of the silicon substrate to change its molecular structure and alter its electrical properties. Silicon Run Implantation explores the various types of ion implanters used in IC fabrication. It also shows the role of energy, electrical potentials, beam analysis, ion acceleration, wafer scanning, and tilting in different ion implanters. This video has a downloadable PDF attached with details on downloading an interactive quiz. The quiz includes footage from the video and is an excellent way for students or trainees to test themselves on how much they know about the processes of semiconductor manufacturing
Analysis
Computer Science and IT
Engineering
Notes
Title from title frames
In Process Record
Event
Originally produced by Silicon Run Productions in 2003