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Subjects (1-6 of 6)
Photoresists.
1
E-book
2016

Design for manufacturability with advanced lithography


Yu, Bei, author

Cham : Springer, 2016

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2
E-book
1993

Diazonaphthoquinone-based resists


Dammel, Ralph, 1954- author.

Bellingham, Washington : SPIE Optical Engineering Press, 1993

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4
E-book
2015

Photopolymers : photoresist materials, processes, and applications


Nakamura, Kenichiro (Chemical engineer), author.

Boca Raton, FL : CRC Press, Taylor & Francis Group, [2015]

Rating:

 
5
E-book
2018

Photopolymers : photoresist materials, processes, and applications


Nakamura, Kenichiro (Chemical engineer), author.

[Place of publication not identified] : CRC Press, 2018

Rating:

 
6
Book
1975

Photoresist : materials and processes


DeForest, William S

New York : McGraw-Hill, 1975

Rating:

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