| Description |
1 online resource (88 pages) |
| Contents |
Plasma Processing of Materials: -- Copyright -- Preface -- Acknowledgments -- Contents -- 1 Summary, Findings, Conclusions, And Recommendations -- SUMMARY -- FINDINGS, CONCLUSIONS, AND RECOMMENDATIONS -- 2 Plasma Processing And Low-Energy Plasma Science -- CLASSIFICATION OF PLASMAS -- BRIEF HISTORY OF LOW-ENERGY PLASMA SCIENCE AND TECHNOLOGY -- INDUSTRIAL APPLICATIONS OF PLASMA PROCESSING OF MATERIALS -- INTERFACE BETWEEN BASIC PLASMA SCIENCE AND APPLICATIONS -- SCOPE OF THIS REPORT -- 3 Plasma Processing In The Electronics Industry |
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MICROELECTRONICS FABRICATIONPLASMA ETCHING -- Anisotropy -- Selectivity -- Uniformity -- Damage -- New Materials -- PLASMA DEPOSITION -- Planarization, Filling, and Interconnection -- Surface Modification -- New Materials -- PLASMA CLEANING -- LOW-PRESSURE PLASMA REACTOR TECHNOLOGY -- Single-Wafer Processing -- Process Control -- New Plasma Sources -- Magnetic Confinement -- Downstream Processing -- Modulated Processing -- Clustered Processing -- THERMAL PLASMA REACTOR TECHNOLOGY -- TOWARD FLEXIBLE MICROELECTRONICS MANUFACTURING |
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FINDINGS AND CONCLUSIONS4 Scientific Foundation of Plasma Processing -- SURFACE PROCESSES -- Theory and Simulation -- Experimental Studies -- Beam-Surface Experiments -- Ex Situ Analysis -- PLASMA GENERATION AND TRANSPORT -- Low-Pressure Plasma Modeling -- Analysis -- Fluid Simulations -- Particle-In-Cell and Kinetic Simulations -- Thermal Plasma Modeling -- Toward Cad Tools And Expert Systems -- Chemical Kinetics -- Multidimensional Modeling and Magnetic Effects -- Stability of Processing Plasmas |
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Accuracy and Reliability of Numerical Simulation MethodsPlasma Diagnostics -- Positive Ions and Neutrals -- Electron Density and Energy Distribution -- Fields -- Negative Ions -- Particulates -- Reference Reactors -- Data Base for Plasma Generation and Transport -- Present Status -- Needs -- Distribution of Information -- PLASMA-SURFACE INTERACTIONS -- Boundary Conditions -- Passive Surfaces -- Particulates -- Microstructure Evolution -- In Situ Analysis -- FUNDING FOR PLASMA PROCESSING RESEARCH -- Japanese Research -- French Research |
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FINDINGS AND CONCLUSIONS5 Educational Issues -- EDUCATIONAL REQUIREMENTS FOR UNDERGRADUATES -- Laboratory Courses and the Scientific Method -- Research Experiences and Cooperative Programs -- U.S. GRADUATE EDUCATION -- TEXTS AND COMPUTER-AIDED INSTRUCTION -- FACULTY DEVELOPMENT -- CONTINUING EDUCATION -- FOREIGN EDUCATIONAL OFFERINGS -- Japan -- France -- FINDINGS AND CONCLUSIONS -- Appendix Participants in Workshop on Plasma Processing of Materials |
| Notes |
Print version record |
| Subject |
Plasma engineering.
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Microelectronics -- Materials -- Effect of radiation on
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Surfaces (Technology)
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Microelectronics -- Materials -- Effect of radiation on
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Plasma engineering
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Surfaces (Technology)
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| Form |
Electronic book
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| ISBN |
9780309583756 |
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0309583756 |
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