Limit search to available items
Book Cover
E-book
Author Mack, Chris A.

Title Fundamental principles of optical lithography : the science of microfabrication / Chris Mack
Published Chichester, West Sussex, England ; Hoboken, NJ, USA : Wiley, [2007]
©2007
Online access available from:
Wiley Online Books    View Resource Record  

Copies

Description 1 online resource (xvii, 515 pages) : illustrations
Contents Fundamental Principles of Optical Lithography: The Science of Microfabrication; Contents; Preface; 1: Introduction to Semiconductor Lithography; 2: Aerial Image Formation -The Basics; 3: Aerial Image Formation -The Details; 4: Imaging in Resist: Standing Waves and Swing Curves; 5: Conventional Resists: Exposure and Bake Chemistry; 6: Chemically Amplified Resists: Exposure and Bake Chemistry; 7: Photoresist Development; 8: Lithographic Control in Semiconductor Manufacturing; 8: Lithographic Control in Semiconductor Manufacturing
Summary The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formatio
Bibliography Includes bibliographical references and index
Notes Print version record
Print version record
Subject Integrated circuits -- Design and construction.
Microlithography -- Industrial applications.
Form Electronic book
ISBN 0470723866
9780470723869